Contribute to groundbreaking research on accelerated thin-film and process development for emerging applications such as ferroelectric memory, photonic integrated circuits and next-generation telecommunications. You'll work at the exciting intersection of experimental materials science and materials informatics, collaborating in an interdisciplinary team.
The focus of this position is to use advanced PVD processes to develop state-of-the art thin films, such as piezoelectric and ferroelectric nitrides. You will use synchronized HiPIMS processes to tune the properties and performance of the films. The experiments will be informed by in-situ surface and interface analysis.
Your work will make use of our group's unique comprehensive infrastructure for materials and device characterization. In addition, the work will benefit from a unique self-driving thin-film laboratory. This laboratory is currently in development and will include sputter deposition and in-situ surface analysis techniques such as RHEED, AES and XPS. Part of the work is also to optimize the workflows in this laboratory in collaboration with the team.
The ability to collaborate in a multidisciplinary research environment is essential. Personal initiative, ability to work systematically, reliability, responsibility, teamwork and communication skills are a must.