Postdoc: Generating Extreme Ultraviolet Light from Plasma with a 2µm Laser

Postdoc: Generating Extreme Ultraviolet Light from Plasma with a 2µm Laser

ARCNL - Advanced Research Center for Nanolithography

Amsterdam, Netherlands

From € 4,552 per month gross

Work Activities

This experiment-oriented postdoctoral position lies at the interface between fundamental physics and industrial application. It is part of activities in ARCNL’s Source Department. The research activities of the Source Department and its EUV Plasma Processes group aim at the atomic- and molecular-level understanding of the fundamental dynamics in the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) light for nanolithography.

Project goal

To identify what light source will power the next generation of lithography machines, we need to understand what plasma conditions are optimal for producing light from plasma, but also we need to understand how such plasma should be generated, and what laser technology should be used. You will join an interdisciplinary team of several PhD students and postdocs in ARCNL’s highly cohesive Source Department and have as an objective to design & execute experiments, and work with advanced laser technologies, to understand the emission of light and ions from plasma that you generate.

Qualifications

• You have (or will soon obtain) a PhD in (Applied) Physics.
• Knowledge of experimental laser and/or plasma physics is an asset, especially if combined with strong hands-on laboratory skills.
• Programming experience, particularly in Python, is welcomed.
• Strong verbal and written communication skills in English are required.