Post-doc Research Position on the Interaction Mechanisms of Plasma with Thin Films

Post-doc Research Position on the Interaction Mechanisms of Plasma with Thin Films

University of Twente

Enschede, Netherlands

€ 4,241 - € 5,538 per month gross

Would you like to unravel the interaction mechanisms of hydrogen plasma with materials of industrial relevance? We are looking for a motivated and skilled post-doctoral researcher to use advanced in situ experiments to understand the effects of hydrogen-based plasma on thin films in direct collaboration with an industry partner.

The interaction of hydrogen plasma with surfaces and thin films is rich in technological applications ranging from materials processing to extreme ultraviolet lithography and plasma catalysis. Despite its technological importance, mechanistic insight into the underlying processes of hydrogen uptake and diffusion in materials is largely lacking, partly due to limited sensitivity of many methods towards hydrogen. In this project, you will develop understanding of hydrogen uptake and transport under realistic test conditions using advanced in-situ monitoring methods. This project will involve collaboration with the Technical University Delft to study hydrogen uptake in materials with in-situ neutron reflectometry.

Your goal is to improve the understanding how plasma, radicals and ions interact with thin-film coatings, with the ultimate aim to predict and improve the lifetime of such coatings. You will design and prepare thin film model systems for measuring hydrogen uptake in materials in the context of EUV lithography, using facilities in the XUV Optics group. You will measure the uptake of hydrogen in these thin films using a newly developed measurement cell for in-situ neutron reflectometry during exposure to hydrogen radicals and/or plasma. The neutron reflectometry measurements will take place at TU Delft. Processing and analysing (fitting) the data will be a major task of the project. The obtained results will be compared with other techniques for measuring hydrogen uptake and diffusion of hydrogen in thin films.

This project is part of a larger research project on the physics of plasma-surface interactions, currently running in the XUV Optics Group at Twente. We develop forefront fundamental research, relevant to high tech applications in collaboration with our industrial partners (Zeiss, ASML, Malvern Panalytical and VDL). The research will take place in a state-of-the-art thin film laboratory within the MESA+ Institute for Nanotechnology at the University of Twente, which will allow you ample opportunities to collaborate and interact with various academic and industrial partners.

Your profile

• You have a PhD degree in physics, physical chemistry or materials science, or expect to obtain your PhD degree soon;
• You have affinity with interaction of plasma or ion beams with surfaces, physical vapour deposition (PVD) of thin films, physics and chemistry of solid surfaces and/or surface or thin film analysis;
• Experience with neutron or X-ray reflectometry or other advanced material characterisation techniques is a big advantage;
• You are an excellent team player in an enthusiastic group of scientists and engineers working on a common theme;
• You are creative, like to push boundaries, and are highly motivated to address a major science challenge in thin film physics;
• You are fluent in English and able to collaborate intensively with industrial and academic parties in regular meetings and work visits.