Postdoctoral Researcher in Atomic Layer Deposition (ALD)

Postdoctoral Researcher in Atomic Layer Deposition (ALD)

Aalto University

Espoo, Finland

From € 4130-4550 per month

We are seeking a motivated candidate to join our team. The successful applicant will be involved in the design, fabrication, and testing of functional thin film coatings.

Key responsibilities include:

• Developing and optimizing advanced surfaces using state-of-the-art thin film technologies;
• Characterizing prepared thin films using scanning electron microscopy and surface wetting methods;
• Analyzing and reporting of obtained results, and planning the future work based on the results;
• Working closely together with the other team members;
• Contributing to the maintenance of the atomic layer deposition tools.

Qualifications:

• PhD in one of the following broader experimental areas: physics, chemistry, materials science;
• Experience with thin film deposition using atomic layer deposition is required;
• Experience with surface characterization (contact angle goniometry, electron microscopy, ellipsometry, spectroscopy, etc.) is beneficial;
• Strong analytical skills and ability to work independently and in a team environment;
• Excellent communication skills (fluency in English) and strong collaboration abilities.