Postdoc Position: Generating Short-wavelength Radiation from Plasma

Postdoc Position: Generating Short-wavelength Radiation from Plasma

ARCNL - Advanced Research Center for Nanolithography

Amsterdam, Netherlands

Work Activities

This experiment-oriented postdoctoral position lies at the interface between fundamental physics and industrial application. It is part of activities in ARCNL’s Source Department. The research activities of the Source Department and its EUV Plasma Processes group aim at the atomic- and molecular-level understanding of the fundamental dynamics in the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) light for nanolithography.

In our group’s research we, for example, uncovered the quantum origins of the generated EUV light [Torretti, Nature Comms. Nature Commun. 11, (2020)], found a universal law for expanding plasma [Sheil, Phys. Rev. Lett. 133, (2024)], and found that less than half the initial droplet volume is present on thin tin sheet targets as used in EUV sources [Liu, Phys. Rev. Appl. 20, (2023)], and work on an alternative EUV source solution [Mostafa, Appl. Phys. Lett. 123, (2023)] – a concept that is most relevant for the current vacancy.

Background

The revolutionary introduction of EUV lithography was the culmination of several decades of collaborative work between industry and science – a Project Apollo of the digital age. The short, 13.5-nm EUV wavelength enables patterning the smallest, smartest, and most energy-efficient features on chips. The required 13.5-nm radiation is generated from plasma that is produced from tiny tin droplets that are heated by powerful laser pulses. At ARCNL, we are now thinking about the next generation of light sources: Can we make more energy efficient and more powerful EUV light sources?

Project goal

To identify what light source will power the next generation of lithography machines, we need to understand what plasma conditions are optimal for producing light from plasma, but also we need to understand how such plasma should be generated, and what laser technology should be used. You will join an interdisciplinary team of several PhD students and postdocs in ARCNL’s highly cohesive Source Department and have as an objective to design & execute experiments, and work with advanced laser technologies, to understand the emission of light and ions from plasma that you generate.

Qualifications

• You have (or will soon obtain) a PhD in (Applied) Physics;
• Knowledge of experimental laser and/or plasma physics is an asset, especially if combined with strong hands-on laboratory skills;
• Programming experience, particularly in Python, is welcomed;
• Strong verbal and written communication skills in English are required.