This project is devoted to developing and employing numerical modelling of hot and dense plasma under conditions relevant for state-of-the-art extreme-ultraviolet (EUV) nanolithography, where laser-driven plasma sources are used to provide the required EUV light. You will provide important insights accompanying the experimental efforts of ARCNL’s Source Department and moreover will directly and independently answer some of the key open questions in the field – using e.g. the simulation packages already available at ARCNL. Moreover, you will provide predictive modelling capabilities to guide the development of next-generation EUV light sources. You will be embedded in the EUV Plasma Processes team at ARCNL, where you will collaborate with a team of talented young researchers: theorists and experimentalists.
The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental chemistry and physics involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Netherlands Organisation for Scientific Research (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Science Park Amsterdam, The Netherlands, and is currently building up towards a size of approximately 100 scientists and support staff.
The research activities of the EUV Plasma Processes group aim at the understanding of the basic dynamics on an atomic and molecular level of the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) light for nanolithography.
You need to meet the requirements for a doctors-degree and must have research experience in a non-Dutch academic environment. Knowledge and/or experience in the field of radiation-hydrodynamic simulations is advantageous. Good verbal and written communication skills (in English) are required.